| 摘要 |
The inventive apparatus measures workfunction values using deflection of an electron beam without direct contact of the electron beam with the sample surface. The apparatus, mounted within a vacuum chamber, includes an electron gun, a position sensitive electron detector, and a sample. The sample is located such that an electron beam emanating from the gun can approach the surface and then be deflected into the position sensitive electron detector. Workfunction values are then derived from a measured deflected-electron position distribution.
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