发明名称 Stage apparatus and exposure apparatus
摘要 A wafer stage system moves a wafer stage that retains a wafer via a wafer holder along a wafer base. For example, the wafer holder is formed from a material whose density is not uniform, such that the portion that includes the reflecting surface that reflects a measuring beam for position measurement is a high-density portion, and the other portions are low-density portions. Or, the wafer stage is formed from a material whose density is not uniform, such that the portion that includes the surface that constitutes a gas bearing is a high-density portion, and the other portions are low-density portions.
申请公布号 US2008036989(A1) 申请公布日期 2008.02.14
申请号 US20070826144 申请日期 2007.07.12
申请人 NIKON CORPORATION 发明人 SHIBAZAKI YUICHI
分类号 G03B27/54;G03B27/58 主分类号 G03B27/54
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