发明名称 Manufacturing method of display device and exposure system for that
摘要 An object of the present invention is to readily minimize inhomogeneity in image quality in a display field on one liquid crystal display panel. A display panel manufacturing method in which a step of forming a thin film on a substrate and a step of etching the thin film are repeated a plurality of times in order to form on the substrate a plurality of scanning signal lines, a plurality of video signal lines that three-dimensionally intersects the plurality of scanning signal lines with an insulating layer between them, and TFT elements and pixel electrodes each disposed in a pixel area enclosed with two adjacent scanning signal lines and two adjacent video signal lines, includes: a step of exposing a resist film using exposure dimensions numerically expressed based on design patterns prepared in advance; a step of etching the thin film using etching resists formed by developing the exposed resist film so as to form thin-film patterns; and a step of correcting the design patterns according to the complete dimensions of the formed thin-film patterns.
申请公布号 US2008036987(A1) 申请公布日期 2008.02.14
申请号 US20070878397 申请日期 2007.07.24
申请人 HITACHI DISPLAYS, LTD. 发明人 NAKAYOSHI YOSHIAKI;MIYAZAKI TAKAHIRO;OOIDA JUN;OHARA KEN
分类号 H01L21/77;G02F1/1368;G03B27/42;G03F1/00;G03F1/68;G09F9/00;G09F9/30 主分类号 H01L21/77
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