Lochmaske und Verfahren zu ihrer Herstellung

摘要

A stencil mask has a thin film (11) having an aperture pattern (14) and a supporting substrate (12) supporting a portion around the edge of the thin film (11). A plug (13) having heat conductance higher than that of the thin film (11) and the supporting substrate (12) is embedded in a state of contacting the thin film (11) and reaches inside of the supporting substrate (12).
Thus, the heat generated in the surface of the stencil mask can be radiated to the supporting substrate quickly. The invention also relates to a method of producing such a stencil mask.