| 摘要 |
A loading table and a plasma processing apparatus having the same are provided to improve the in-plane uniformity of an electric field strength in a plasma and perform plasma processing of high in-plane uniformity for a substrate. A conductive member is connected to a high-frequency power source, and serves as an ion supply electrode. A dielectric layer(22) is formed to cover a center portion of an upper surface of the conductive member to make a high-frequency electric field, which is applied to plasma via a substrate, uniform. An electrostatic chuck(23) is laminated on the dielectric layer, and has electrode films(23b,23d) spaced apart from in a diametric direction of a loading table. An outer edge of the dielectric layer is positioned immediately under an inner edge of a spaced region(23c) of the separated electrode films.
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