发明名称 ELECTROPLATING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a new electroplating method suitable for filling a non-penetrating hole with a metal. <P>SOLUTION: Regarding the electroplating method where a blind via hole is filled with a metal, in the electroplating method using a plating liquid comprising additives such as a surfactant, a brightener and a smoother, the method includes: a pulse plating stage where the adsorption and leaving of the additives on the surface of the member to be plated and in the non-penetrating hole are controlled; and the subsequent direct current plating stage where the inside of the non-penetrating hole is filled with a metal. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008031516(A) 申请公布日期 2008.02.14
申请号 JP20060205665 申请日期 2006.07.28
申请人 NIPPON MACDERMID KK 发明人 NISO KEISUKE;IISHIMA MORIO;ANDO NAOMI
分类号 C25D5/18;C25D3/38;C25D7/00;C25D7/12 主分类号 C25D5/18
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