| 摘要 |
PROBLEM TO BE SOLVED: To retain a substrate after being correctly positioned, and to relieve the shock when releasing the retention. SOLUTION: A spin chuck 1 is provided with three sets of positioning and retaining members F1-F3 and three sets of auxiliary retaining members S1-S3, which are respectively abutted against different positions of the circumferential rim parts of a wafer W, to retain the same in substantially horizontal posture. The positioning and retaining members F1-F3 are operated together by a first operation conversion mechanism FT1, while the auxiliary retaining members S1-S3 are operated together by the second operation conversion mechanism FT2. When the wafer W is to be retained, the wafer W is positioned and retained by the positioning and retaining members F1-F3 at first; and thereafter, the wafer W is retained auxiliarily by the auxiliary retaining members S1-S3. When the retention of the wafer W is released, the retention by the auxiliary retaining members S1-S3 is released first; and thereafter, retention by the positioning and retaining members F1-F3 is released. COPYRIGHT: (C)2008,JPO&INPIT |
