| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of structure having a nano-scale pattern by a simple method. SOLUTION: The manufacturing method of structure having a pattern comprises: a first pattern formation process (Fig. (b)) for forming a first pattern by pressing a stamper having an irregular structure on a surface to the pattern formation region of a layer to be processed; and a second pattern formation process (Fig. 1(c)) for forming a second pattern, by moving the relative positions between the pattern formation region when the first pattern is formed, and the stamper, and pressing the stamper to at least one portion of the pattern formation region. COPYRIGHT: (C)2008,JPO&INPIT |
