发明名称 Semiconductor device and method of manufacturing the same
摘要 The semiconductor device which is hard to generate malfunction and whose reliability of an element is high, and its manufacturing method are offered. Each of a plurality of convex patterns is formed on the front surface of a semiconductor substrate so that it may have a floating gate and a control gate. The insulating layer has covered the side surface and the upper surface of a plurality of convex patterns, and the bottom between convex patterns. A contact interlayer insulating layer covers the cavity part located via an insulating layer between a plurality of convex patterns and on a plurality of convex patterns, and has a through hole. An insulating layer closes a through hole and occludes the cavity part.
申请公布号 US2008035985(A1) 申请公布日期 2008.02.14
申请号 US20070882164 申请日期 2007.07.31
申请人 RENESAS TECHNOLOGY CORP. 发明人 SHIMIZU SATOSHI;IKEDA YOSHIHIRO
分类号 H01L29/788;H01L21/31 主分类号 H01L29/788
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