发明名称 EXPOSURE EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To maintain a state in which the pressure of a projection optical system space is higher compared to its surrounding space, and to prevent oscillation produced by a mechanism for supplying a gas into the equipment from being transmitted to the projection optical system. <P>SOLUTION: A bulkhead 3 is prepared within a chamber 1 that forms a projection optical system space S. A gas supply pipeline 11 is prepared through the chamber 1 and the bulkhead 3 from outside, and this gas supply pipeline 11 is connected to a gas adjustment mechanism 12 outside the chamber 1. The bulkhead 3 is provided with a hole, through which the gas supply pipeline 11 is installed by using a sealing material 13. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008034770(A) 申请公布日期 2008.02.14
申请号 JP20060209447 申请日期 2006.08.01
申请人 CANON INC 发明人 NANBA HISASHI;HAYASHI TATSUYA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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