| 摘要 |
PROBLEM TO BE SOLVED: To reduce the consumption of treatment liquid to facilitate coping with the difference of treatment times in a plurality of treatment processes and shorten a substrate conveying time between treatment liquid tanks. SOLUTION: The substrate treatment device is equipped with a chemical liquid tank 21, a rinse liquid tank 22, and a plurality of substrate retaining units 10. The chemical liquid 45 is stored in the tank main body 31 of the chemical liquid tank 21 under a status that the chemical liquid 45 is raised up by a surface tension from the opening 30 on the upper surface thereof. The rinse liquid 61 is stored in the tank main body 51 of the rinse liquid tank 22 under a status that the same is raised up from the opening 50 on the upper surface thereof. The level 45a of the chemical liquid 45 and the level 61a of the rinse liquid 61 are in the horizontal surface of the same height. The substrate retaining unit 10 retains the substrate W under a status that a main surface of the substrate or the treatment surface is faced downward and the treatment surface is contacted with the liquid levels 45a, 61a. The substrate retaining unit 10 is moved along the liquid levels 45a, 61a while retaining the status of contacting with the liquid. COPYRIGHT: (C)2008,JPO&INPIT
|
