| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film free from an appearance defect, an optical low-pass filter, a solid state image sensor, and a digital still camera. <P>SOLUTION: The antireflection film 10 is constituted of a four-layered structure which consists of, in order from a substrate 11 side, thin films of a first layer 12, a second layer 13, a third layer 14, and a fourth layer 15. The first layer 12 and the third layer 14 are mixed oxide films mainly composed of Ti and La. The second layer 13 and the fourth layer 15 are composed of a principal component SiO<SB>2</SB>. The first layer 12 is 2,000±0.200 in refractive index (n1), and 16.7 nm in film thickness (d1). The second layer 13 is 1,460±0.200 in refractive index (n2), and 30.8 nm in film thickness (d2). The third layer 14 is 2,000±0.200 in refractive index (n3), and 139.2 nm in film thickness (d3). The fourth layer 15 is 1,460±0.200 in refractive index (n4), and 88.4 nm in film thickness (d4). <P>COPYRIGHT: (C)2008,JPO&INPIT |
