| 摘要 |
The invention relates to a device for the plasma and/or coating treatment of workpieces comprising a chamber ( 2 ) that can be evacuated, a holding device ( 3 ) for the workpieces to be treated that is rotatably mounted within the chamber ( 2 ) and a plasma source ( 4 ). In order to create a device of the above mentioned type that enables the treatment of relatively great workpieces with respect to the size of the device, the invention proposes that the plasma source ( 4 ) is placed within the chamber ( 2 ), for which purpose the at least one cathode ( 5 ) and the least one anode ( 6 ) of the plasma source ( 4 ) are mounted on the upper side or lower side ( 7, 8 ) inside the chamber ( 2 ).
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