发明名称 |
LINEAR EVAPORATOR FOR VAPOR DEPOSITION OF VERTICAL THIN FILM |
摘要 |
A linear vapor deposition source for vapor deposition of a vertical substrate is provided to prevent clogging of an opening by maintaining the temperature of a crucible and the opening of a dot vapor deposition source similarly. A linear vapor deposition source for vapor deposition of a vertical substrate(10) is composed of the predetermined number of dot vapor deposition sources(100). The dot vapor deposition source comprises a crucible(31) and a heating part. An upper part of the crucible is open, and a vapor deposition material(20) is put into the inner part of the crucible. The heating part heats the crucible. The dot vapor deposition sources are arranged to make a spreading distance of the vapor deposition material different respectively.
|
申请公布号 |
KR20080014316(A) |
申请公布日期 |
2008.02.14 |
申请号 |
KR20060075841 |
申请日期 |
2006.08.10 |
申请人 |
SEMES CO., LTD. |
发明人 |
KIM, KYONG HO;JOUNG, YOUNG CHUL |
分类号 |
H01L21/205;H01L21/22 |
主分类号 |
H01L21/205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|