发明名称 LINEAR EVAPORATOR FOR VAPOR DEPOSITION OF VERTICAL THIN FILM
摘要 A linear vapor deposition source for vapor deposition of a vertical substrate is provided to prevent clogging of an opening by maintaining the temperature of a crucible and the opening of a dot vapor deposition source similarly. A linear vapor deposition source for vapor deposition of a vertical substrate(10) is composed of the predetermined number of dot vapor deposition sources(100). The dot vapor deposition source comprises a crucible(31) and a heating part. An upper part of the crucible is open, and a vapor deposition material(20) is put into the inner part of the crucible. The heating part heats the crucible. The dot vapor deposition sources are arranged to make a spreading distance of the vapor deposition material different respectively.
申请公布号 KR20080014316(A) 申请公布日期 2008.02.14
申请号 KR20060075841 申请日期 2006.08.10
申请人 SEMES CO., LTD. 发明人 KIM, KYONG HO;JOUNG, YOUNG CHUL
分类号 H01L21/205;H01L21/22 主分类号 H01L21/205
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