| 发明名称 |
POSITIVE RESIST COMPOSITION FOR MULTILAYER RESIST AND PATTERN FORMING METHOD USING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for multilayer resist used on an intermediate layer comprising a silicone-based hard mask material. <P>SOLUTION: The positive resist composition for multilayer resist used on an intermediate layer comprising a silicone-based hard mask material contains a component of which the alkali solubility increases by the action of an acid and an acid generator having a cationic moiety represented by formula (b1-4). <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2008033016(A) |
申请公布日期 |
2008.02.14 |
| 申请号 |
JP20060206448 |
申请日期 |
2006.07.28 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
UCHIUMI YOSHIYUKI;YAMASHITA NAOKI |
| 分类号 |
G03F7/004;G03F7/039;G03F7/11;G03F7/26;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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