| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in resolution and capable of forming a resist pattern of a good profile and a resist pattern forming method. <P>SOLUTION: The positive resist composition comprises a resin component (A) and an acid generator component (B), wherein the component (A) comprises a constitutional unit (a1) derived from hydroxystyrene and a constitutional unit (a2) having an acetal type acid-dissociable dissolution inhibiting group, and the component (B) comprises an acid generator (B1) having an anionic moiety represented by formula (b-5), wherein R<SP>7"</SP>is a hydrocarbon group which may have a substituent. <P>COPYRIGHT: (C)2008,JPO&INPIT |
