发明名称 ELECTROSTATIC CHUCK
摘要 <P>PROBLEM TO BE SOLVED: To provide an electrostatic chuck which has high surface smoothness, is capable of restraining particles from occurring, equipped with an outstanding attraction/detachment performance, and formed of silica glass material. <P>SOLUTION: The electrostatic chuck has a configuration that it is composed of a tabular base material 1 formed of silica glass, a dielectric layer 2 of silica glass material which has a volume resistivity of 10<SP>8</SP>to 10<SP>12</SP>&Omega;cm and an additive of 0.1 to 30% of, at least, an element selected from three elements, TiO<SB>2</SB>, SnO<SB>2</SB>, and ZnO, and a metal electrode 3 which is embedded between the material 1 and the layer 2. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008034496(A) 申请公布日期 2008.02.14
申请号 JP20060204081 申请日期 2006.07.27
申请人 COVALENT MATERIALS CORP 发明人 ENOMOTO KOJI;KIMIJIMA SUSUMU;MURAYAMA HARUO;SUZUKI KENJI
分类号 H01L21/683;G03F9/00;H01L21/027;H02N13/00 主分类号 H01L21/683
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