发明名称 PLASMA CLEANING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma cleaning apparatus capable of avoiding abnormal electric discharge and evenly carrying out plasma washing of a plurality of printed substrates in a magazine. <P>SOLUTION: A vacuum chamber 1 is kept in a prescribed vacuum state and high frequency voltage from a high frequency power source 10 is applied to a left part electrode 2 and a right part electrode 3 via an automatic-matching box 11. Consequently, plasma reactive gas is introduced into the vacuum chamber 1 via introduction inlets 1A and 1B in the right and left side walls of the vacuum chamber 1 and oxygen gas, which is the plasma reactive gas, is introduced into the vacuum chamber 1, penetrates the left part electrode 2 and the right part electrode 3, and is made plasma between both electrodes 2 and 3 to become radical. The oxygen radical causes chemical reaction with contaminants adhering to printed substrates in a magazine 7 and discharged through a discharge port 1C formed in the rear wall of the vacuum chamber 1. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008029930(A) 申请公布日期 2008.02.14
申请号 JP20060204440 申请日期 2006.07.27
申请人 HITACHI HIGH-TECH INSTRUMENTS CO LTD 发明人 FUKUDA MASAYUKI;MURAKAMI NAOYA
分类号 B08B7/00;H05H1/46;H05K3/26 主分类号 B08B7/00
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