ELECTROSTATIC CHUCK DEVICE

摘要

Disclosed is an electrostatic chuck device which enables to perform a plasma process having high in-plane uniformity to a plate-like sample by improving the in-plane uniformity of the electric field intensity in a plasma when applied to a plasma processing apparatus. Specifically disclosed is an electrostatic chuck device (21) comprising an electrostatic chuck portion (22), a metal base portion (23) serving as a high-frequency generating electrode, and an insulating plate (24). The electrostatic chuck portion (22) is composed of a dielectric plate (31) whose upper surface (31a) serves as a mounting surface on which a plate-like sample (W) is placed, a supporting plate (32), an internal electrode (25) for electrostatic suction, and an insulating material layer (33). The internal electrode (25) for electrostatic suction is made of a composite sintered body containing an insulating ceramic and silicon carbide, while having a volume resistivity of not less than 1.0 x 10^-1 O cm but not more than 1.0 x 10⁵ O cm.