LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING LITHOGRAPHIC APPARATUS, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus adapted to compensate for a disturbance of mirror surfaces.

SOLUTION: The lithographic apparatus includes a system to compensate for an influence of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus are presented which are implemented using various scan trajectories of the substrate table and measurements of the local positions and rotations of the lateral mirrors in the substrate table. A dual stage lithographic apparatus is provided with alignment marks to definitely establish the geometric configuration of the lateral mirrors, which are used only in the exposure station, so that the geometric configuration of the lateral mirrors can be measured while the substrate table is in the measurement station.

COPYRIGHT: (C)2008,JPO&INPIT