发明名称 SUBSTRATE STAGE, AND HEAT TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate stage that prevents the occurrence of peeling electrification while having high wear resistance. SOLUTION: A prescribed emboss shape E is formed by emboss processing onto a placing face 12 formed in a stage body 11 so as to place a substrate W on it. Then, an amorphous alumina film A is formed by anodization. The alumina film A having an amorphous structure is dense and firm. Consequently, it is almost possible to prevent the occurrence of peeling electrification while having high wear resistance. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008034481(A) 申请公布日期 2008.02.14
申请号 JP20060203729 申请日期 2006.07.26
申请人 TOHOKU UNIV;FUTURE VISION:KK;KOYO THERMO SYSTEM KK 发明人 OMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI
分类号 H01L21/683;H01L21/027;H01L21/304 主分类号 H01L21/683
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