发明名称 |
SUBSTRATE STAGE, AND HEAT TREATMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate stage that prevents the occurrence of peeling electrification while having high wear resistance. SOLUTION: A prescribed emboss shape E is formed by emboss processing onto a placing face 12 formed in a stage body 11 so as to place a substrate W on it. Then, an amorphous alumina film A is formed by anodization. The alumina film A having an amorphous structure is dense and firm. Consequently, it is almost possible to prevent the occurrence of peeling electrification while having high wear resistance. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008034481(A) |
申请公布日期 |
2008.02.14 |
申请号 |
JP20060203729 |
申请日期 |
2006.07.26 |
申请人 |
TOHOKU UNIV;FUTURE VISION:KK;KOYO THERMO SYSTEM KK |
发明人 |
OMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI |
分类号 |
H01L21/683;H01L21/027;H01L21/304 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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