发明名称 Methods for oriented growth of nanowires on patterned substrates
摘要 The present invention is directed to systems and methods for nanowire growth and harvesting. In an embodiment, methods for nanowire growth and doping are provided, including methods for epitaxial oriented nanowire growth using a combination of silicon precursors, as well as us of patterned substrates to grow oriented nanowires. In a further aspect of the invention, methods to improve nanowire quality through the use of sacrifical growth layers are provided. In another aspect of the invention, methods for transferring nanowires from one substrate to another substrate are provided.
申请公布号 US2008038520(A1) 申请公布日期 2008.02.14
申请号 US20060641939 申请日期 2006.12.20
申请人 NANOSYS, INC. 发明人 PAN YAOLING;DUAN XIANGFENG;DUBROW ROBERT S.;GOLDMAN JAY;MOSTARSHED SHAHRIAR;NIU CHUNMING;ROMANO LINDA T.;STUMBO DAVID P.;FISCHER-COLBRIE ALICE;SAHI VIJENDRA;ROBBINS VIRGINIA
分类号 B32B15/02;B05D5/12 主分类号 B32B15/02
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