| 摘要 |
<p>An exposing apparatus and a method for manufacturing a device are provided to compute surface-position information by using an interval between a first image formed by a mark arranged on a reticle stage and a second image formed by a measurement light reflected from the mark. An exposing apparatus is provided with a reticle stage(RS), an illuminating optical system(IL) for illuminating a reticle maintained by the reticle stage, a substrate stage(WS), and a projecting optical system(UL) for projecting a pattern of the reticle onto a substrate maintained by the substrate stage. The exposing apparatus includes an imaging device, a measurement optical system, and a controller configured to compute surface-position information of the surface based on an output from the imaging device. The imaging device photographs a first image formed by a measurement light passing through a mark arranged on the reticle stage and a second image formed by the measurement light reflected from the mark. The controller computes the surface-position information based on an interval between the first and the second images from the image device.</p> |
