发明名称
摘要 PROBLEM TO BE SOLVED: To provide a cleaning liquid to be used prior to stripping a resist, with the liquid in which the resist hardly stripped with only a conventional resist stripper can be easily removed. SOLUTION: Stripping of the resist is made easy by using the cleaning liquid containing ammonia or ammonium ion and having≥1% hydrogen peroxide concentration. COPYRIGHT: (C)2003,JPO
申请公布号 JP4045408(B2) 申请公布日期 2008.02.13
申请号 JP20020024858 申请日期 2002.01.31
申请人 发明人
分类号 G03F7/42;H01L21/027;H01L21/304 主分类号 G03F7/42
代理机构 代理人
主权项
地址