发明名称 PROCESS FOR PRODUCING DISPERSION OF HOLLOW FINE SiO2 PARTICLES, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM
摘要 <p>To provide a process for producing a dispersion of hollow fine SiO 2 particles which contains no residual core fine particles, generates no uncontrollable agglomerates, and is easy to filtrate. A process for producing a dispersion of hollow fine SiO 2 particles having hollow fine SiO 2 particles dispersed in a dispersion medium, which comprises at least the following steps (a), (b) and (c): (a) a step of reacting a precursor of SiO 2 at a pH higher than 8 in the presence of fine ZnO particles constituting the core in the dispersion medium to form SiO 2 , thereby to obtain a dispersion of fine particles comprising the fine ZnO particles covered with the formed SiO 2 ; (b) a step of mixing an acidic cation exchange resin with the dispersion of fine particles obtained in the above step (a) to bring them into contact with each other, to dissolve the fine ZnO particles as the core at a pH within a range of from 2 to 8; and (c) a step of separating the acidic cation exchange resin by solid-liquid separation after the fine ZnO particles are completely dissolved, to obtain the dispersion of hollow fine SiO 2 particles.</p>
申请公布号 EP1886972(A1) 申请公布日期 2008.02.13
申请号 EP20060729277 申请日期 2006.03.16
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 KAWAI, YOHEI;YONEDA, TAKASHIGE
分类号 C01B33/141;G02B1/11 主分类号 C01B33/141
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