<p>A pretreatment composition of: (a) at least one compound having structure VI <?in-line-formulae description="In-line Formulae" end="lead"?>V1-Y-V2 VI<?in-line-formulae description="In-line Formulae" end="tail"?> in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.</p>
申请公布号
EP1885819(A2)
申请公布日期
2008.02.13
申请号
EP20060771813
申请日期
2006.06.02
申请人
FUJIFILM ELECTRONIC MATERIALS USA, INC.
发明人
POWELL, DAVID, B.;NAIINI, AHMAD, A.;METIVIER, N. JON;RUSHKIN, IL'YA;HOPLA, RICHARD
