发明名称 |
DISPERSION CONTAINING HOLLOW SiO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM |
摘要 |
<p>To provide a dispersion of hollow SiO 2 , capable of obtaining, when formed into a coating composition, an antireflection film having high antireflection properties and low chroma saturation by forming a low refractive index coating film having a refractive index gradient. A dispersion of fine silica particles, having agglomerated particles which are agglomerates of primary fine particles of hollow SiO 2 dispersed in a dispersion medium, wherein the average particle size of the agglomerated particles is within a range of from 60 to 400 nm, and the average particle size is at least 1.5 times the average primary particle size of the silica. When a coating composition containing the dispersion is to be obtained, the matrix component is preferably a precursor of a metal oxide or an organic resin. By applying the coating composition to a substrate, a substrate with an antireflection coating film is obtained.</p> |
申请公布号 |
EP1887059(A1) |
申请公布日期 |
2008.02.13 |
申请号 |
EP20060729565 |
申请日期 |
2006.03.20 |
申请人 |
ASAHI GLASS COMPANY, LTD. |
发明人 |
KAWAI, YOHEI;YONEDA, TAKASHIGE |
分类号 |
C09D17/00;B05D5/06;B05D7/24;B32B7/02;B32B27/20;C01B33/18;C09D5/00;C09D7/12;C09D201/00;G02B1/11 |
主分类号 |
C09D17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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