发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, AND, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD AND METHOD FOR MANUFACTURING PARTITION WALL FOR PLASMA DISPLAY PANEL USING THE COMPOSITION |
摘要 |
A photosensitive resin composition which comprises (A) a binder polymer, (B) a photo-polymerizable compound having a polymerizable ethylenic unsaturated bond, (C) a photo-radical polymerization initiator comprising a 2,4,5-triaryl imidazole dimer or a derivative thereof and (D) a compound represented by the following general formula (1): (1) wherein R1 and R2 each independently represent an alkyl group having 1 to 20 carbon atoms or the like, and R3, R4, R5, R6, R7, R8, R9 and R10 each independently represent a hydrogen atom or the like.
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申请公布号 |
KR20080014071(A) |
申请公布日期 |
2008.02.13 |
申请号 |
KR20077030100 |
申请日期 |
2006.07.03 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
MIYASAKA MASAHIRO;KUMAKI TAKASHI |
分类号 |
G03F7/028;G03F7/004;G03F7/031;H01J9/02;H01J11/22;H01J11/34;H01J11/36;H05K3/06 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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