发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT
摘要 <p>A photosensitive resin composition comprising compound (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin and 1,2-quinonediazide compound (b). A photosensitive resin composition satisfactorily excelling in photosensitivity, image contrast, resolution and adherence can be obtained by addition of the component of 1,2-quinonediazide compound (b) to the component (a) obtained by reacting a polybasic acid anhydride with phenolic hydroxyl of a novolac phenolic resin.</p>
申请公布号 KR20080014025(A) 申请公布日期 2008.02.13
申请号 KR20077028891 申请日期 2006.07.19
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 SAWABE KEN;NOJIRI TAKESHI
分类号 G03F7/008;G03F7/004 主分类号 G03F7/008
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