IMAGE SENSOR AND METHOD FOR FORMING THE SAME

摘要

An image sensor and a method for manufacturing the same are provided to improve condensing efficiency of the image sensor by using an inner lens without increasing an aspect ratio. A first dielectric(30) is formed on a semiconductor substrate(10) on which a light receiving device(14) is formed. A metal wire(45) is formed on the first dielectric. A molding layer(65) is formed between the metal wires. The molding layer has an upper surface that is convex downwardly. A second dielectric(70) is formed on the semiconductor substrate and includes an inner lens(75) contacted to the molding layer. The inner lens is convex downwardly. A micro lens(90) is formed on the inner lens. When the metal lens is formed, a metal layer is formed on the first dielectric. A mask pattern is formed on the metal layer. The metal layer is etched by using the mask pattern as an etch mask. When the molding layer is formed, a third dielectric is formed on the substrate where the metal wire and the mask pattern are formed. Etch rates of the mask pattern and the third dielectric are different.