PLASMA PROCESSING APPARATUS

摘要

A plasma processing apparatus is provided to prevent ions on a plasma from coming down by reducing an opening size of a mesh which constitutes a plasma passage. A grid(110) is spaced apart from a substrate which is mounted on a bottom electrode(120), at a predetermined interval, and has a frame of lattice structure and a mesh installed between lattices. The DC bias is applied to the grid. The frame is provided with plural source jet holes evenly distributed on a bottom surface of the frame in a tubular shape. The source jet holes are connected with at least two source injection pipes(112). The source jet holes are formed at lattice crossing points of the frame.