| 摘要 |
A wet etcher is provided to prevent a substrate from being bent and to reduce a process defective by using a partition disposed on a lower portion of a process chamber. A wet etcher includes a process chamber(100) providing a space in which an etching process is performed, an outlet port(150) positioned under the process chamber for supplying an etching solution. An area with the etching solution is divided into plural subordinate sections(210) by a partition(200). The outlet port is attached to a lateral side of the process chamber. The etching solution is sprayed by a shower head(110) at an upper portion of the process chamber, and a substrate is moved by a transfer unit(120).
|
