发明名称 VAPORIZER FOR LIQUID SOURCE
摘要 A vaporizer for a liquid source is provided to improve vaporization rate and to prevent generation of particles by preventing generation of residues in the vaporizer. A liquid source is injected into a preliminary vaporizing portion(200). The preliminary portion vapors at least part of the liquid source. A main vaporizing portion(300) is connected to the preliminary vaporizing portion. The partially vaporized liquid source is moved along a flow channel and vaporized in the main vaporizing portion. An auxiliary vaporizing portion(400) is connected to the main vaporizing portion. A vaporization state of the vaporized liquid source is maintained in the auxiliary vaporizing portion. A heating device(500) heats at least part of the main vaporizing portion, the preliminary vaporizing portion, and the auxiliary vaporizing portion. A source supplying portion(100) supplies the liquid source and carrier gas. The source supplying portion includes a first supplying pipe(101) and a second supplying pipe(102). The first supplying pipe supplies the liquid source from at least one liquid supplying source. The second supplying pipe supplies the carrier gas from at least one carrier gas supplying source.
申请公布号 KR20080013447(A) 申请公布日期 2008.02.13
申请号 KR20060074978 申请日期 2006.08.09
申请人 HANBON CO., LTD. 发明人 JANG, SE HWAN;OH, DAE SUNG
分类号 H01L21/205 主分类号 H01L21/205
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