发明名称 Method of producing polishing pad
摘要 A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface.
申请公布号 US7329170(B2) 申请公布日期 2008.02.12
申请号 US20060366238 申请日期 2006.03.02
申请人 TOYO TIRE & RUBBER CO., LTD. 发明人 ONO KOICHI;SHIMOMURA TETSUO;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;KOMAI SHIGERU;TSUTSUMI MASAYUKI
分类号 B24B1/00;B24B37/04;B24B37/20;B24B37/22;B24B37/24;B24D3/28;B24D11/00 主分类号 B24B1/00
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