发明名称 |
Method of producing polishing pad |
摘要 |
A method of producing a polishing pad having a polishing layer is characterized in that the polishing layer is produced by a photolithographic method including: forming a sheet molding from a curing composition containing at least an initiator and an energy ray-reactive compound to be cured with energy rays; exposing the sheet molding to energy rays to induce modification thereof, to change the solubility of the sheet molding in a solvent; and developing the sheet molding after irradiation with energy rays, to partially remove the curing composition with a solvent thereby forming a concave and convex pattern at least one surface. |
申请公布号 |
US7329170(B2) |
申请公布日期 |
2008.02.12 |
申请号 |
US20060366238 |
申请日期 |
2006.03.02 |
申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
ONO KOICHI;SHIMOMURA TETSUO;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;KOMAI SHIGERU;TSUTSUMI MASAYUKI |
分类号 |
B24B1/00;B24B37/04;B24B37/20;B24B37/22;B24B37/24;B24D3/28;B24D11/00 |
主分类号 |
B24B1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|