MASK AND MANUFACTURING APPARATUS FOR POLY SILICON SUBSTRATE HAVING THE SAME

摘要

An apparatus for fabricating a polysilicon substrate having a mask is provided to maintain a particle length uniformly by straightening the grain boundary of a polysilicon layer. An insulation substrate(10) having an amorphous silicon layer(12) is disposed on a stage. A mask(300) is disposed on the insulation substrate and includes a base plate(310) and a plurality of slit parts(320) that are aligned at regular intervals at a predetermined angle with one side of the insulation substrate. A laser generating unit is disposed on the mask and irradiates a laser beam with one shot to the insulation substrate through the slit parts so that the amorphous silicon layer begins to be crystallized to form a polysilicon layer. A transfer apparatus is coupled to the stage and transfers the stage so that the mask is transferred by a uniform pitch along a direction parallel with one side of the insulation substrate. The slit part has a rectangular shape.