发明名称 |
Patterning nanoline arrays with spatially varying pitch |
摘要 |
A nanoimprint mold is described, comprising a plurality of alternating layers of distinct materials differentially etched along an edge thereof, said layers having spatially varying thicknesses along said edge such that nanolines patterned with said nanoimprint mold have corresponding spatially varying pitches.
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申请公布号 |
US7329115(B2) |
申请公布日期 |
2008.02.12 |
申请号 |
US20050061226 |
申请日期 |
2005.02.18 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
WANG SHIH-YUAN;ISLAM M. SAIF |
分类号 |
B29C59/00 |
主分类号 |
B29C59/00 |
代理机构 |
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