发明名称 Method and apparatus for inspecting defects
摘要 In a defect inspecting apparatus, having contrast, brightness and appearance of a target for inspection and detection sensitivity of a defect changed depending on optical system conditions, and adapted to perform inspection by selecting an optimal test condition, even an unskilled user can easily select an optimal optical condition by quantitatively displaying evaluation values side by side when optical system conditions are changed. Moreover, by selecting an evaluation item having highest satisfaction based on a result of a series of test inspection, an optimal test condition can be automatically selected.
申请公布号 US7330248(B2) 申请公布日期 2008.02.12
申请号 US20050089881 申请日期 2005.03.25
申请人 HITACHI, LTD. 发明人 SAKAI KAORU;MAEDA SHUNJI;OKABE TAKAFUMI;WATANABE MASAHIRO
分类号 G01B11/30;G01N21/88;G01B21/30;G01N21/94;G01N21/95;G01N21/956;G01N23/04;G01N23/06;G01N23/225;G01N23/227;G06T1/00;H01L21/66 主分类号 G01B11/30
代理机构 代理人
主权项
地址