发明名称 SUBSTRATE DETECTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
摘要 A substrate detecting mechanism and a substrate processing apparatus using the same are provided to improve detection accuracy of a substrate by using a substrate detection sensor and a space detection sensor. A supporting member supports a substrate at a transferable height position. A substrate detection sensor(141) detects whether the substrate is placed at the transferable height position supported by the supporting member. A space detection sensor(142) detects whether the substrate is placed at a downward position with respect to the transferable height position supported by the supporting member. In case the substrate detection sensor detects the substrate being placed at the transferable height position and the space detection sensor detects the substrate being not placed at the downward position, a calculator(151) determines a supporting state of the substrate as a normal state. Otherwise, if the substrate detection sensor detects the substrate being not placed at the transferable height position or the space detection sensor detects the substrate being placed at the downward position, the calculator determines the supporting state of the substrate as an abnormal state.
申请公布号 KR20080012779(A) 申请公布日期 2008.02.12
申请号 KR20070077693 申请日期 2007.08.02
申请人 TOKYO ELECTRON LIMITED 发明人 HIGUCHI KATSUTOSHI;ISHITA SHIGEO;ICHIKAWA SHINJI
分类号 H01L21/683 主分类号 H01L21/683
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