| 摘要 |
<p>A photosensitive resin composition, a cured product obtained from the composition, a material for a color filter prepared by using the composition, and a color filter using the material are provided to improve heat resistance, adhesion, chemical resistance and the development in an alkali aqueous solution. A photosensitive resin composition comprises 100 parts by weight of a radiation polymerizable and thermal polymerizable unsaturated compound comprising the repeating unit represented by the formula 1 and the repeating unit represented by the formula 2 and having an acid value of 60-120 mg KOH/g; 50 parts by weight or less of at least one compound selected from a (meth)acrylic monomer and a (meth)acrylic oligomer; and 0.1-40 parts by weight of at least one compound selected from a photopolymerization initiator, a sensitizer and a radical polymerization initiator, wherein R1 and R2 are H, a C1-C5 alkyl group or a halogen atom; R3 is H or a methyl group; X is -CO-, -SO2, -C(CF3)2-, -Si(CH3)2-, -CH2-, -C(CH3)2-, -O-, a specific aromatic group, or a direct bond; Y is the residue of an acid anhydride; Z is the residue of an acid dianhydride; and m/n is 91/9 to 100/0.</p> |
