| 摘要 |
A method is describe for fabricating memory components including memory cells based on an active material of an active layer, the phase state of which can be changed and which is enclosed between a bottom electrode and a top electrode. To reduce the current intensity of the programming current and the erase current required for programming and erasing of the memory element and therefore the quantity of heat which is required to change the phase state, a nanoporous aluminium oxide layer is used as a mask during the production of the active layer or the interface with the electrodes. The nanoporous aluminium oxide layer can be used as a positive mask, as a negative mask, or used directly as an insulating current aperture. The contact surface between electrode and active layer can be set in virtually any desired form by varying the process parameters of the aluminium oxide mask. Since the typical cell area of the memory cell is significantly larger than the mean diameter of the nanopores, a good homogeneity and reproducibility of the contacts results from a production engineering standpoint.
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