| 摘要 |
A wet cleaning apparatus is provided to improve an operating rate and process yield by shortening an interval of replacement time of a cleaning solution. A cleaning solution is filled in a processing bath(110) wherein a substrate is soaked into the cleaning solution and a cleaning process is performed on the substrate. Process liquid is supplied by a plurality of supply lines. A mixing member receives the process liquids from the supply lines and mixes the supplied process liquids to generate a cleaning solution. The cleaning solution is supplied from the mixing member to the processing bath by a cleaning solution supply line. The processing bath includes an inner bath and an outer bath. In the inner bath, the substrate is soaked and a cleaning process for removing the foreign substances remaining on the surface of the substrate is performed. In the outer bath, the cleaning solution overflowing from the inner bath is received wherein the outer bath surrounds the inner bath. The cleaning solution supply line can supply a cleaning solution to the inner bath and the outer bath simultaneously.
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