| 摘要 |
Wet substrate processing equipment is provided to improve the stability of work surroundings by effectively preventing a process solution and fume generated by the process solution from being exposed to external surroundings. A processing bath(110) has an inner space filled with a process solution wherein a substrate is soaked into the space and the foreign substances remaining on the surface of the substrate is eliminated. The process solution is stored in a storage receptacle(210). The process solution is supplied from the storage receptacle to the processing bath by a process solution supply line(230). A sealing member(240) isolates the storage receptacle from external surroundings, installed outside the storage receptacle to surround the storage receptacle and made of a fluororescein-based synthetic resin. The sealing member can be at least one selected from a group of PTEFE(polytetrafluoroethylene), PFA(polyfluoroalkoxy), FEP(tetrafluoroethylene hexafluoropropylene), PE(polyethylene), PP(polypropylene) and PVDF(poly vinyleddene difluoride).
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