An imprinting apparatus and a method thereof are provided to change movement speed and pressure of a pressing roller during a mold pressing process, thereby obtaining a uniform residual film thickness over the front of the substrate. A substrate support(10) is for mounting a substrate coated with resin in its upper surface. An imprinting mold(20) is disposed in an upper side of the substrate support and forms a uniform pattern by forming the resin. A pressing roller(40) closely contacts the substrate with the imprinting mold by pressing the imprinting mold. A roller control unit(60) controls the pressing roller so that movement speed and apply pressure of the pressing roller may be changed according to a location of the imprinting mold. A resin hardening unit hardens the resin for imprinting on the substrate.
申请公布号
KR20080012112(A)
申请公布日期
2008.02.11
申请号
KR20070001522
申请日期
2007.01.05
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, DAE JIN;KIM, KYU YOUNG;BAE, JUNG MOK;BAE, JU HAN