| 摘要 |
A method comprises an electrolytic deposition on the conductive aluminum bases of metal-sulfide deposit that cathodal deposited from solution g/l: FeSО- 7-10; NiSО– 1.0-1.5; CuSО– 0.3-0.5; NaMoО– 3.0-5.0; NaSO– 5.0-5.5, at temperature of 20-25 °С, рН=4.0-5.0 and I=1.5-3.5 mА/sm. Before electrolytic deposition on the conductive aluminum bases it is contact deposited zinc sublayer with following treatment it in the solution NaS, g/L: 7-10, ratio of deposit thickness and conductive bases thickness is (10-12):1 accordingly. As metal-sulfide deposit it is used iron-sulfide, molybdenum -sulfide or cobalt-sulfide deposit. Thickness of conductive aluminum bases is 10-15 mkm. |
