| 摘要 |
<p>A composition for forming a photosensitive organic insulating layer, and an organic insulating layer prepared by using the composition are provided to improve the adhesion with a substrate remarkably and to enhance sensitivity. A composition for forming a photosensitive organic insulating layer comprises a photosensitive material; an alkali soluble resin; a solvent; and an acrylic copolymer containing a photosensitive group at terminal represented by the formula 1, wherein R, R1, R2 and R3 are independently H, CH3, an alkyl group or an aryl cyclic group; and a, b, c and d are independently an integer of 0-3. Preferably the composition comprises further a thermal acid generator represented by the formula 2, wherein R is an alkyl group or OH.</p> |
