| 摘要 |
The present invention relates to a mask and a method of manufacturing a microlens using the mask, which condenses external light in a CMOS image sensor so that the microlens irradiated by means of a photodiode can have an excellent radius of curvature. With the present invention, the phase shift mask for forming the microlens in the CMOS image sensor is formed by stacking at least two phase shifting layers having different transmissivity from each other so that the microlens can have even size when forming the microlens using the phase shift mask and the microlens can have even curvature regardless of the location of the mask pattern array. |
