| 摘要 |
A salt suitable for an acid generator is provided to produce a chemically amplified positive resist composition capable of forming a pattern having high sensitivity and high resolution. A salt has a structure represented by the following formula 1, wherein each of P^1, P^2, and P^3 independently represents a C1-30 alkyl group substituted with at least one group selected from the group consisting of hydroxyl groups, C3-12 cyclic hydrocarbon groups, and C1-12 alkoxy groups, or a C3-30 cyclic hydrocarbon group substituted with at least one group selected from the group consisting of hydroxyl groups and C1-12 alkoxy groups, with the proviso that all of P^1, P^2, and P^3 are not substituted phenyl groups, and each of Q^1 and Q^2 is independently a fluorine atom or C1-6 perfluoroalkyl group.
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