INDUCTIVELY COUPLED PLASMA ANTENNA AND PLASMA GENERATING APPARATUS FOR USING THE SAME

摘要

An ICP(Inductively Coupled Plasma) antenna and a plasma generating apparatus using the same are provided to reduce inductance of the ICP antenna and to improve uniformity and stability of plasma by using helical segments wound on the ICP antenna. A first helical segment(31) and a second helical segment(31) are wound on a cylindrical plasma generator(30). An ICP antenna(30) includes the cylindrical plasma generator and supplies power of a high frequency power source(40) to one of the first and second segments, thereby variable-controlling generation of plasma. The high frequency power source supplies a high frequency power to the ICP antenna. The helical segments are selectively switched as a switching member to variable-control the generation of the plasma. Variable resistors are further provided to variable-control strength of flux generated by electric field at the helical segments.