| 摘要 |
CVD equipment is provided to prevent the clog of an injector and to increase a replacement interval of the injector by using a cleaning module for cleaning the injector in which a TEOS liquid flows. A reactive chamber(200) provides a closed space. A reactive gas supply unit(400) supplies a first reactive gas in the reactive chamber. A reactive gas supply line(410) is communicated with the reactive gas supply unit and the reactive chamber to flow the first reactive gas. A raw material supply unit(600) supplies one or more liquid materials being used for generating a second reactive gas that is mixed with the first reactive gas. A liquid raw material supply line(610) flows the liquid raw material from the raw material supply unit to the reactive gas supply line. An injector(700) injects the liquid raw material at a section where the liquid raw material supply line and the reactive gas supply line are connected to each other. A cleaning module includes an inert gas supply unit, inert gas supply lines, and an LSU valve. The inert gas supply unit generates a pressurized inert gas to clean the liquid raw material on an inner wall of the injector or a deposition material generated by a chemical combination between the liquid raw material and the first reactive gas.
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