| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having high sensitivity and resolution, high tent film strength, excellent adhesion and a profound effect on prevention of break of an unexposed film by combining predetermined polymerizable compounds and adjusting the sensitivity of a photosensitive layer to a certain range, and to provide a pattern forming apparatus and a pattern forming method. <P>SOLUTION: The pattern forming material comprises a support and at least a photosensitive layer on the support, wherein the photosensitive layer contains at least a binder, a polymerizable compound and a photopolymerization initiator, the polymerizable compound containing a polymerizable compound (a-1) having a bisphenol skeleton and a polymerizable compound (a-2) having four or more reactive groups per molecule and a molecular weight of ≥700, and when the photosensitive layer is exposed, minimum energy of light which is used for the exposure and does not change the thickness of a portion to be exposed after the exposure and development is 0.1-50 mJ/cm<SP>2</SP>. The pattern forming method uses the pattern forming material. <P>COPYRIGHT: (C)2008,JPO&INPIT |
